Ultrapure Water Micro 2018 Preliminary Agenda

Ultrapure Micro 2018 - Day 1

Thursday, May 31, 2018

8:00-8:15

Introduction and Awards

The Ultrapure Micro team and Co-Moderators will discuss what to expect from the conference, as well as give the award for the best presentations from the 2017 conference. 

8:15-8:45

Keynote Presentation

Mustafa Badaroglu, Qualcomm

Moore’s law has been slowing down due to electrical, patterning, and yield limits. Fortunately, emerging forces such as new device architecture, optimization and applications are driving the industry. How will cloud computing and connectivity change the growing market and how will it impact water and chemicals management?

8:50-9:30

Yield IRDS & SEMI Standards

Reinforced Process of Enabling Advanced Existing and Future Semiconductor Technologies

Slava Libman will present updated standards and procedures from the IRDS working group focused on UPW. 

9:30-10:00

COFFEE BREAK

Ultrapure Water

10:00 - 12:00

UPW Session 1
Advanced Analytical Methods for UPW

Use of Extraction Modeling ... CT Associates, Balazs NanoAnalysis, | 10:00

Use of Extraction Modeling to Predict Contamination Levels in Ultrapure Water Systems
– Gary Van Schooneveld, CT Associates
– Balazs NanoAnalysis
– Enviro Energy Solutions
– FTD Solutions

Method for Preparing Ultra-low ... 3M, RP Innovative Engineering Solutions| 10:30

Method for Preparing Ultra-low PPT Level DO in UPW Using Membrane Degassifiers to Enable Superior Wafer Surface Preparation
– Amit Sengupta, 3M
– RP Innovative Engineering Solutions, LLC

Online Urea Monitoring for ... Organo| 11:00

Online Urea Monitoring for Ultrapure Water Production in Semiconductor Fabrication Plants
– Kazushige Takahashi, Organo

Online Measurement of Total ... GF Signet, CT Associates| 11:30

Online Measurement of Total Active Ions Activity of Chemicals at Sub-ppb Levels Using Advanced Resistivity Algorithms
– Steven Wells, GF Signet
– CT Associates

High Purity Chemicals

10:00 - 12:00

HPC Session 1
High Purity Chemicals in Semiconductor Manufacturing

Relationship Between Contaminants and ... Intel Corporation| 10:00

Relationship Between Contaminants and Defects in the World of High Purity Chemicals
– Don Hadder, Intel Corporation

Ultra High Purity Chemical ... Samsung Austin Semiconductor| 10:30

Ultra High Purity Chemical Challenges
– Daniel Stucky, Samsung Austin Semiconductor

The Analysis and Stability ... Agilent Technologies| 11:00

The Analysis and Stability of High Purity TetraMethylAmmonium Hydroxide (TMAH) with the Agilent 8900 QQQ-ICPMS
– Mark Kelinske, Agilent Technologies

Online 24/7 Single-ppt ... Elemental Scientific| 11:30

Online 24/7 Single-ppt Metals Monitoring for Semiconductor Process Chemicals Using a Central ICPMS Detector Connected to 20 Remote Automated Samplers
– Daniel Wiederin, Elemental Scientific

Water Management Track

10:00 - 12:00

WM Session 1
Water Management for Advanced Semiconductor Industry

MEC or Membrane Enhanced ... Ovivo| 10:00

MEC or Membrane Enhanced Crystallizer; a New Process for Semiconductor HF Wastewater Treatment
– Sylvain Kaev, Ovivo Switzerland
– Ovivo Deutschland GmbH

Copper Ion Exchange ... Samsung Austin Semiconductor, Evoqua| 10:30

Copper Ion Exchange at SAS: Concept to Large-Scale Design
– Mike Knapp, Samsung Austin Semiconductor
– Evoqua Water Technologies

A Novel Approach ... PeroxyChem| 11:00

A Novel Approach for the Treatment of Wastewater Generated During Semiconductor Wafer Fabrication
– Kevin Huang, PeroxyChem

Performance of Membrane Distillation ... KTH Royal institute of Technology, Sweden, IMEC| 11:30

Performance of Membrane Distillation for TMAH Wastewater Treatment in Nano-electronics Industries – Case Study: IMEC, Belgium
– Imtisal-E Noor, KTH Royal institute of Technology, Sweden
– XZero AB imec, Belgium Scarab Development

12:30-13:30

Lunch

Sponsored by

Ultrapure Water

1:00-2:30

UPW Session 1 Cont.

Detection of Non-Volatile ... ETH Zurich| 1:00

Detection of Non-Volatile Trace-Impurities in Ultrapure Water With Universal Surface Enhanced Raman Spectroscopy
– Ali Özhan Altun, ETH Zurich

UPW Session 2
Particle analysis and control in UPW

USE OF FOCUSED AEROSOL ... CT ASSOCIATES, AEROSOL DEVICES| 1:30

The Use of Focused Aerosol Deposition (FAD) to Capture, Identify and Quantify Killer Defect Particles in UPW
– Gary Van Schooneveld, CT Associates
– Aerosol Devices, Inc.
– Kanomax FMT

EVALUATION OF THE PARTICLE ... ORGANO, ENVIRO ENERGY SOLUTIONS| 2:00

Evaluation of the Particle Behavior in Ultrapure Water System Distributions Using 10 Nm or Larger Particles Measuring Method
– Kyohei Tsutano, Organo Corporation
– Enviro Energy Solutions

High Purity Chemicals

1:00-2:30

HPC Session 1 Cont.

STOP USING DETECTION LIMITS ... SACHEM| 1:00

Stop Using Detection Limits for ICP-MS
– Anthony Schleisman, Sachem
– Dan Montville, Sachem

HPC Session 2
High Purity Chemicals in Semiconductor Manufacturing

EVALUATION OF TRACE TOTAL ... SUEZ| 1:30

Evaluation of Trace Total Organic Carbon in High Purity Sulfuric Acid
– Brett Clark, Suez Water Technologies & Solutions

UNDERSTANDING NANOPARTICLE CONTAMINATION IN ... PARTICLE MEASURING SYSTEMS| 2:00

Understanding Nanoparticle Contamination in Chemical Distribution Systems – Data Analysis Strategies
– Dan Rodier, Particle Measuring Systems

WATER MANAGEMENT TRACK

1:00-2:30

WM Session 1 Cont.

WAY TO OPERATE RO ... IDE TECHNOLOGIES| 1:00

Way to Operate RO system Without Fouling
– Boris Lieberman, IDE Technologies

WM Session 2
Efficient Cooling Water Systems’ Operations and Management

COOLING WATER DIAGNOSTICS AND ... SAMSUNG AUSTIN SEMICONDUCTOR, NALCO| 1:30

Cooling Water Diagnostics and Oxidizing Biocides Combination to Control Biofouling
– Stephen N’Guessan, Samsung Austin Semiconductor
– Nalco Water

BENEFITS OF SIDE-STREAM ... NXP SEMICONDUCTORS, NALCO| 2:00

2:30-2:50

COFFEE BREAK

Ultrapure Water

2:50-3:50

UPW Session 2 Cont.

Non-Traditional ICP-MS Analysis ... Air Liquide| 2:50

A Non-Traditional ICP-MS Analysis for Nanoparticles Characterization of Ultra-Pure Water
– Jinjin Wang, Air Liquide – Balazs Nanoanalysis

Nanoparticle Profiling in a ... Ovivo, Micron Technology| 3:20

Nanoparticle Profiling in a UPW Polishing Section by Different Monitoring Systems: Advanced Understanding of Sources and Sinks
– Maria Pia Herrliing, Ovivo Switzerland
– Micron Technology

High Purity Chemicals

2:50-3:50

HPC Session 2 Cont.

Correlating Particle Counter Data ... MGN International | 2:50

Correlating Particle Counter Data Between Different Instruments
– Mike Naggar, MGN International

Purification Method for High ... Organo| 3:20

Purification Method for High Purity PGMEA Using Ion Exchange Resins and Analysis of High Sensitive Trace Metals by ICP-MS
– Yasuhiro Yoshimura, Organo Corporation

Water Management Track

2:50-3:50

WM Session 2 Cont.

Simple idea - Big Value ... FTD Solutions| 2:50

Simple idea – Big Value in Cooling Towers Operation
– Gil Maron, FTD Solutions

PCW Best Practices ... Nalco| 3:20

PCW Best Practices
– Philip Yu, Nalco Water

3:50-4:00

TRANSITION BREAK

4:00-5:45

Roundtables Session

The UPM 2018 Roundtables Session is a platform to exchange ideas and insights and to engage with one another in a more conversational setting. No microphones, so slideshows. Each Roundtable Speaker will lead three 30-minutes discussion groups.

5:45-6:45

Drink Reception

Sponsored by

7:00-10:00

Dinner at Threadgill's

Sponsored by

Ultrapure Micro 2018 - Day 2

Friday, June 1, 2018

Ultrapure Water

9:00-10:30

UPW Session 3
Solving current UPW challenges with Innovative Design Solutions

UPUR – A Metal-free ... Ovivo| 9:00

UPUR – A Metal-free Combination of Several UPW Polishing Steps in a Multifunctional Reactor for the Removal of TOC and H2O2 Traces
– Philippe Rychen, Ovivo Switzerland AG
– Ovivo Deutschland
– Applied University Furtwangen

Optimization of UPW System ... Nomura Micro Science| 9:30

Optimization of UPW System with Improved Ion Exchange Resin
– Hiroshi Kimoto, Nomura Micro Science Co.,Ltd.

Highly Cross Linked Membranes ... Lanxess| 10:00

Highly Cross Linked Membranes Improve Silica, Boron, Nitrate, and Urea Rejection
– Jerry Aguilar. Lanxess

High Purity Chemicals

9:00-10:30

HPC Session 3
High Purity Chemicals in Semiconductor Manufacturing

New Approach for Metal ... Majid Entezarian| 9:00

A New Approach for Metal Ion Purification to Meet the Needs for Trace Metal Reduction for 10nm Node and Beyond
– Majid Entezarian, 3M

Purification of Chemicals for ... Organo| 9:30

Purification of Chemicals for Semiconductor Use by Ultra-Clean Ion Exchange Resins
– Akira Nakamura , Organo Corporation

Evaluating the Risk of Metal ... Sumco| 10:00

Evaluating the Risk of Metal Contamination from Wet Cleaning of Silicon Wafers by HF-last Process
– Drew Sinha, Sumco

Water Management Track

9:00-10:30

WM Session 3
Strategic Site Water Management at the Fab

Proven Success of Innovative ... Intel Corporation| 9:00

Proven Success of Innovative Water Management Solutions for Advanced Semiconductor Manufacturing
– Alex Milshteen, Intel Corporation

Water Treatment System Hacks ... ON Semiconductor, H2Morgan| 9:30

Water Treatment System Hacks – Maintain, Expand, and Optimize your Water and Wastewater Treatment Systems Without Breaking the Bank
– Brad Herbert, ON Semiconductor
– H2Morgan

Keeping Increasingly Complex Water ... FTD Solutions| 10:00

Keeping Increasingly Complex Water Management Simple
– Alex Evashenk, FTD Solutions

10:30-11:00

COFFEE BREAK

Ultrapure Water

11:00-12:30

UPW Session 3 Cont.

Removal of Silica in Primary ... Kurita, Kyushu University| 11:00

Removal of Silica in Primary Pure Water System
– Takaaki Chuuman, Kurita Water Industries Ltd.
– Kyushu University

Filter Media Removal Characteristics ... Pall, RBFM Consulting| 11:30

Filter Media Removal Characteristics in the Low nm Range
– Jochen Ruth, Pall GmbH
– RBFM Consulting

Closed Circuit Reverse Osmosis ... Desalitech| 12:00

Closed Circuit Reverse Osmosis, the New Standard for Industrial Desalination
– Matthew Jones, Desalitech

High Purity Chemicals

11:00-12:30

HPC Session 3 Cont.

Empirical Model to Understand ... Entegris| 11:00

Empirical Model to Understand the Flush up Behavior of Particles During Bulk Chemical Filtration
– Anthony Ozello, Entegris

Combined Track
Technology and Project Management in Semiconductor Water and Chemicals

Molecular Dynamics Analysis of ... Organo, Osaka University| 11:30

Molecular Dynamics Analysis of a Water-Methanol Liquid Mixture Behavior on a Silicon Wafer Surface
– Masayuki Kawakami, Organo Corporation
– Osaka University

Case Study: Leveraging Value ... Texas Instruments, FTD Solutions| 12:00

Case Study: Leveraging Value Engineering to Achieve Major Cost Savings in UPW System Capacity Upgrade
– John Heye, Texas Instruments
– David Buesser, FTD Solutions

Water Management Track

11:00-12:30

WM Session 3 Cont.

Water Conservation in Semiconductor ... Intel Corporation| 11:00

Water Conservation in Semiconductor Industry: UPW and Beyond
– Irina Belozerova, Intel Corporation

Semiconductor End of Pipe ... Texas Instruments, Ovivo| 11:30

Semiconductor End of Pipe Wastewater Reclaim System – Piloting Data
– Ben Winsett, Texas Instruments
– Ovivo Switzerlnand
– Ovivo USA

WM Session 4
Brine Management

Construction of a Brine ... Rimon| 12:00

Construction of a Brine Line to the Sea as a Solution for Salt Removal From Wastewater
– Alon Tish, Rimon Ltd

12:30-1:30

Lunch

Ultrapure Water

1:30-3:30

UPW Session 4
Optimization of UPW System Operation

Operational Challenges in Backend ... Intel Corporation| 1:30

Operational Challenges in Backend UPW Systems
– Chelsea Tura, Intel Corporation

Impact of Sleeves Quartz Quality ... Heraeus Quarzglas| 2:00

Impact of Sleeves Quartz Quality to the Total Costs of Ownership of UP Water Reactor (UV@185nm)
– Klaus Zoltner, Heraeus Quarzglas GmbH & Co. KG

sTPC Enabled New UPW ... Samsung Austin Semiconductor | 2:30

sTPC Enabled New UPW Ultra Filter Product Quality for Microelectronic Manufacturing
– James Lee, Samsung Austin Semiconductor

Strange Case of the ... Intel Corporation| 3:00

Strange Case of the High Dollar RO Maintenance Bill: Unsolved Rapid Membrane Degradation and Undissolved Metal Fouling
– Jas Wai Yeng Cheong, Intel Corporation

High Purity Chemicals

1:30-3:30

Combined Track Cont.

Retrofitting a Traditional UPW ... Intel Corporation, Design Group - Facilities Solutions| 1:30

Retrofitting a Traditional UPW Make Up System to Accomplish Recovery Rates of >95% Utilizing HERO and the Challenges it Presents
– Robert Kirwan, Intel Corporation
– Design Group – Facilities Solutions

Hot UPW Shutdown and ... Samsung Austin Semiconductor| 2:00

Hot UPW Shutdown and Return to Production: An Operational Guide to Minimizing System Impact and Planning for the Unknown
– Charlotte Parks, Samsung Austin Semiconductor

Strategies for Electrical Energy ... H2Morgan, Energy 350| 2:30

Strategies for Electrical Energy Reduction Required for Producing High Purity Water and then Qualifying for Capital Rebate Programs to Offset and Improve ROI of Energy Reducing Capital Projects.
– John Morgan, H2Morgan
– Energy 350

Thermoplastic Pipe Stress Modeling ... Georg Fischer Piping Systems| 3:00

Thermoplastic Pipe Stress Modeling – Best Known Methods for a Safe and Reliable Long-Life Piping System
– Hanspeter Muller, Georg Fischer Piping Systems

Water Management Track

1:30-3:30

WM Session 4 Cont.

Brine Management Options: Technology ... Saltworks Technologies| 1:30

Brine Management Options: Technology, Innovation, & Economics for Zero Liquid Discharge
– Joshua Zoshi, Saltworks Technologies

WM Session 5
Analytical Water Management for Semiconductor Industry

A Day in the Life ... Intel Corporation| 2:00

A Day in the Life of an Analytical Engineer
– Glen Slayter, Intel Corporation

Trace Metal Analyzer Method ... Aqua Metrology Systems, Samsung Austin Semiconductor| 2:30

Trace Metal Analyzer Method: Case Study SAS
– Rex Sistek, Aqua Metrology Systems Limited, Samsung Austin Semiconductor

Development of Self-Cleaning ... HORIBA Advanced Techno, MIE University| 3:00

Development of Self-Cleaning pH Electrode Coated with Titanium Oxide (TiO2) and Its Photocatalytic Activity
– Yuji Nishio, HORIBA Advanced Techno
– MIE University

3:30-3:45

TRANSITION BREAK

3:45-4:45

Closing Panel

Details coming soon.