+1 (512) 879-4208
May 30 – June 1, 2018
Hyatt Regency Hotel
208 Barton Springs Rd
Austin, TX 78704
The Ultrapure Micro conference explores the latest trends in microelectronics industry water and chemicals management.
The technical program has multiple, topically oriented tracks, roundtable sessions and hands-on, in-depth training sessions in advance of the conference to serve as a primer or refresher. No other industry event covers the breadth or depth of water and chemical issues for semiconductors.
3M: A New Approach for Metal Ion Purification to Meet the Needs of Trace Metal Reduction for 10nm Node and Beyond
3M: Method for preparing ultra-low PPT level DO in UPW using membrane degassifiers to enable superior wafer surface preparation
Agilent Technologies: The Analysis and Stability of High Purity TetraMethylAmmonium Hyrdoxide (TMAH) with the Agilent 8900 QQQ-ICPMS
Air Liquide – Balzas NanoAnalysis: A Non-traditional ICP-MS Analysis for Nanoparticles Characterization of Ultra-Pure Water (UPW)
CT Associates, Enviro Energy Solutions, Air Liquide – Balazs NonoAnalysis, and FTD Solutions: Use of Extraction Modeling to Predict Contamination Levels in Ultrapure Water Systems
H2Morgan: Creating a Roadmap to Improved System Operation, Capital equipment utilization, and Increased Resource Optimization though developing a dynamic water balance model.
HORIBA and MIE University: Development of Self-Cleaning pH Electrode Coated with Titanium Oxide (TiO2) and Its Photocatalytic Activity
IDE Technologies: WAY TO OPERATE RO SYSTEM WITHOUT FOULING
Intel & Design Group – Facilities Solutions: Retrofitting a traditional UPW Make Up system to Accomplish Recovery Rates of >95% utilizing HERO and the Challenges it Presents
Intel: A Day in the Life of an Analytical Engineer
Intel: Operational Challenges in Backend UPW Systems
Organo: Purification method for high purity PGMEA using ion exchange resins and analysis of high sensitive trace metals by ICP-MS
Organo: Purification of Chemicals for Semiconductor Use by Ultra-clean Ion Exchange Resins
Ovivo & Applied University Furtwangen: UPUR – A Metal-free Combination of Several UPW Polishing Steps in a multifunctional reactor for the Removal of TOC and H2O2 Traces.
Ovivo & Micron Technology: Nanoparticle profiling in a UPW polishing section by different monitoring systems: advanced understanding of sources and sinks
Pall and RBFM Consulting: Filter media removal characteristics in the low nm range